Reflectance measurements of amorphous ZrxNi100-x alloys using a new NIR/NIV/UV system (bibtex)
by Christopher Braun
Abstract:
A new NIR/VIS/UW system was set up to measure absolute reflectance. The technique employed is such that the sample is its own reference thus making surface features and dimensions of the reference and sample inconsequential. The system was originally designed to operate using an in-situ evaporation. However, this approach yielded unreliable results. Thus, instead an external evaporation was adopted. The reflectance of silicon and chromium was measured and found to be in good agreement with literature data.
Reference:
Christopher Braun, "Reflectance measurements of amorphous ZrxNi100-x alloys using a new NIR/NIV/UV system", 1997.
Bibtex Entry:
@bachelorsthesis{1997B,
  title={Reflectance measurements of amorphous Zr<sub>x</sub>Ni<sub>100-x</sub> alloys using a new NIR/NIV/UV system},
  author={Christopher Braun},
  month={May},
  year={1997},
  abstract={A new NIR/VIS/UW system was set up to measure absolute reflectance. The
technique employed is such that the sample is its own reference thus making
surface features and dimensions of the reference and sample
inconsequential. The system was originally designed to operate using an
in-situ evaporation. However, this approach yielded unreliable results.
Thus, instead an external evaporation was adopted. The reflectance of
silicon and chromium was measured and found to be in good agreement with
literature data.},
  note={Supervised by M. Reedyk}
}
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